Versatile Post-Doping toward Two-Dimensional Semiconductors

  • Yuya Murai
    Department of Chemistry, Nagoya University, Nagoya, Aichi 464-8602, Japan
  • Shaochun Zhang
    Department of Chemistry, Nagoya University, Nagoya, Aichi 464-8602, Japan
  • Takato Hotta
    Department of Chemistry, Nagoya University, Nagoya, Aichi 464-8602, Japan
  • Zheng Liu
    Innovative Functional Materials Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Nagoya, Aichi 463-8560, Japan
  • Takahiko Endo
    Department of Physics, Tokyo Metropolitan University, Hachioji, Tokyo 192-0397, Japan
  • Hiroshi Shimizu
    Department of Physics, Tokyo Metropolitan University, Hachioji, Tokyo 192-0397, Japan
  • Yasumitsu Miyata
    Department of Physics, Tokyo Metropolitan University, Hachioji, Tokyo 192-0397, Japan
  • Toshifumi Irisawa
    Device Technology Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
  • Yanlin Gao
    Department of Physics, Graduate School of Pure and Applied Sciences, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Tsukuba 305-8571, Japan
  • Mina Maruyama
    Department of Physics, Graduate School of Pure and Applied Sciences, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Tsukuba 305-8571, Japan
  • Susumu Okada
    Department of Physics, Graduate School of Pure and Applied Sciences, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Tsukuba 305-8571, Japan
  • Hiroyuki Mogi
    Faculty of Pure and Applied Sciences, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Tsukuba 305-8571, Japan
  • Tomohiro Sato
    Faculty of Pure and Applied Sciences, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Tsukuba 305-8571, Japan
  • Shoji Yoshida
    Faculty of Pure and Applied Sciences, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Tsukuba 305-8571, Japan
  • Hidemi Shigekawa
    Faculty of Pure and Applied Sciences, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Tsukuba 305-8571, Japan
  • Takashi Taniguchi
    International Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
  • Kenji Watanabe
    Research Center for Functional Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
  • Ruben Canton-Vitoria
    Department of Chemistry, Nagoya University, Nagoya, Aichi 464-8602, Japan
  • Ryo Kitaura
    Department of Chemistry, Nagoya University, Nagoya, Aichi 464-8602, Japan

説明

We have developed a simple and straightforward way to realize controlled postdoping toward 2D transition metal dichalcogenides (TMDs). The key idea is to use low-kinetic-energy dopant beams and a high-flux chalcogen beam simultaneously, leading to substitutional doping with controlled dopant densities. Atomic-resolution transmission electron microscopy has revealed that dopant atoms injected toward TMDs are incorporated substitutionally into the hexagonal framework of TMDs. The electronic properties of doped TMDs (Nb-doped WSe

収録刊行物

  • ACS Nano

    ACS Nano 15 (12), 19225-19232, 2021-11-29

    American Chemical Society (ACS)

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