Plasma-surface interaction in negative hydrogen ion sources

DOI PDF 2 Citations 28 References Open Access
  • Motoi Wada
    Graduate School of Science and Engineering, Doshisha University , Kyotanabe, Kyoto 610-0321, Japan

Abstract

<jats:p>A negative hydrogen ion source delivers more beam current when Cs is introduced to the discharge, but a continuous operation of the source reduces the beam current until more Cs is added to the source. This behavior can be explained by adsorption and ion induced desorption of Cs atoms on the plasma grid surface of the ion source. The interaction between the ion source plasma and the plasma grid surface of a negative hydrogen ion source is discussed in correlation to the Cs consumption of the ion source. The results show that operation with deuterium instead of hydrogen should require more Cs consumption and the presence of medium mass impurities as well as ions of the source wall materials in the arc discharge enlarges the Cs removal rate during an ion source discharge.</jats:p>

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