Use of a DNA film on a self-assembled monolayer for investigating the physical process of DNA damage induced by core electron ionization
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- Ayumi Narita
- Japan Atomic Energy Agency, Shirakata, Tokai, Naka, Ibaraki, Japan
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- Kentaro Fujii
- Japan Atomic Energy Agency, Shirakata, Tokai, Naka, Ibaraki, Japan
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- Yuji Baba
- Japan Atomic Energy Agency, Shirakata, Tokai, Naka, Ibaraki, Japan
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- Iwao Shimoyama
- Japan Atomic Energy Agency, Shirakata, Tokai, Naka, Ibaraki, Japan
書誌事項
- 公開日
- 2016-05-19
- 資源種別
- journal article
- DOI
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- 10.1080/09553002.2016.1179812
- 公開者
- Informa UK Limited
この論文をさがす
説明
A novel two-layer sample composed of a deoxyribonucleic acid (DNA) film and self-assembled monolayer (SAM) was prepared on an inorganic surface to mimic the processes in which DNA is damaged by soft X-ray irradiation.A mercaptopropyltrimethoxysilane (MPTS) SAM was formed on a sapphire surface, then oligonucleotide (OGN) molecules were adsorbed on the MPTS-SAM. The thicknesses and chemical states of the layers were determined by X-ray photoelectron spectroscopy (XPS) and near-edge X-ray fine structure (NEXAFS) around the phosphorus (P) and sulfur (S) K-edges. To induce the damage to the OGN molecules, the sample was irradiated with synchrotron soft X-rays. The chemical state of the OGN molecules before and after irradiation was examined by NEXAFS around the nitrogen (N) K-edge region.The thickness of the MPTS-OGN layer was approximately 7.7 nm. The S atom of the OGN molecules was located at the bottom of the OGN layer. The peak shape of the N K-edge NEXAFS spectra of the MPTS-OGN layers clearly changed following irradiation.The MPTS-OGN layer formed on the sapphire surface. The chemical states and the structure of the interface were elucidated using synchrotron soft X-rays. The OGN molecules adsorbed on the MPTS films decomposed upon exposure to soft X-ray irradiation.
収録刊行物
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- International Journal of Radiation Biology
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International Journal of Radiation Biology 92 (11), 733-738, 2016-05-19
Informa UK Limited