High‐Resolution Spin‐on‐Patterning of Perovskite Thin Films for a Multiplexed Image Sensor Array
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- Woongchan Lee
- Center for Nanoparticle Research Institute for Basic Science (IBS) Seoul 08826 Republic of Korea
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- Jongha Lee
- Center for Nanoparticle Research Institute for Basic Science (IBS) Seoul 08826 Republic of Korea
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- Huiwon Yun
- Center for Nanoparticle Research Institute for Basic Science (IBS) Seoul 08826 Republic of Korea
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- Joonsoo Kim
- Center for Nanoparticle Research Institute for Basic Science (IBS) Seoul 08826 Republic of Korea
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- Jinhong Park
- Center for Nanoparticle Research Institute for Basic Science (IBS) Seoul 08826 Republic of Korea
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- Changsoon Choi
- Center for Nanoparticle Research Institute for Basic Science (IBS) Seoul 08826 Republic of Korea
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- Dong Chan Kim
- Center for Nanoparticle Research Institute for Basic Science (IBS) Seoul 08826 Republic of Korea
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- Hyunseon Seo
- Center for Nanoparticle Research Institute for Basic Science (IBS) Seoul 08826 Republic of Korea
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- Hakyong Lee
- Center for Nanoparticle Research Institute for Basic Science (IBS) Seoul 08826 Republic of Korea
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- Ji Woong Yu
- School of Chemical and Biological Engineering Seoul National University (SNU) Seoul 08826 Republic of Korea
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- Won Bo Lee
- School of Chemical and Biological Engineering Seoul National University (SNU) Seoul 08826 Republic of Korea
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- Dae‐Hyeong Kim
- Center for Nanoparticle Research Institute for Basic Science (IBS) Seoul 08826 Republic of Korea
説明
<jats:title>Abstract</jats:title><jats:p>Inorganic–organic hybrid perovskite thin films have attracted significant attention as an alternative to silicon in photon‐absorbing devices mainly because of their superb optoelectronic properties. However, high‐definition patterning of perovskite thin films, which is important for fabrication of the image sensor array, is hardly accomplished owing to their extreme instability in general photolithographic solvents. Here, a novel patterning process for perovskite thin films is described: the high‐resolution spin‐on‐patterning (SoP) process. This fast and facile process is compatible with a variety of spin‐coated perovskite materials and perovskite deposition techniques. The SoP process is successfully applied to develop a high‐performance, ultrathin, and deformable perovskite‐on‐silicon multiplexed image sensor array, paving the road toward next‐generation image sensor arrays.</jats:p>
収録刊行物
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- Advanced Materials
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Advanced Materials 29 (40), 2017-08-28
Wiley
