Single‐Crystal Cu2 O  Formation on Amorphous Carbon Electrode and Effect of Anions on the Crystal Habit of Cu2 O  Particles

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  • Da‐ling Lu
    The Institute for Solid State Physics, The University of Tokyo, 7‐22‐1, Roppongi, Minato‐ku, Tokyo 106, Japan
  • Ken‐ichi Tanaka
    The Institute for Solid State Physics, The University of Tokyo, 7‐22‐1, Roppongi, Minato‐ku, Tokyo 106, Japan

書誌事項

公開日
1996-07-01
権利情報
  • https://iopscience.iop.org/page/copyright
  • https://iopscience.iop.org/info/page/text-and-data-mining
DOI
  • 10.1149/1.1836966
公開者
The Electrochemical Society

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説明

Electrodeposition of Cu 2+ ion resulted in the growth of Cu 2 O single-crystal particles on an amorphous carbon electrode in solution. Cu 2 O single crystals grow at potentials higher than -0.55 V vs. saturated calomel electrode (SCE) in CsClO 4 (pH 7) as well as H 2 SO 4 (pH 2.0) and HCl (pH 2.1) solutions. However, Cu 2 O as well as Cu particles are formed simultaneously at potentials below -0.55 V vs. SCE. The oxygen in the Cu 2 O may come from water via cuprous hydroxide intermediate. The effect of anions on the crystal habit of the Cu 2 O particles was investigated by changing anions. Hexahedral Cu 2 O single-crystal particles were preferentially formed in CsClO 4 solution, but in the presence of sulfate ion the Cu 2 O particles grow in a po yhedral form. Y-shape particles of Cu 2 O were obtained in the presence of chloride ion, which may be due to the effect of stronger adsorption of Cl - on the surface of growing particles. Number density and average size of the particles grown on the electrode vs. the kind of anions and electrodeposition potential are discussed.

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