Degradation mechanism of AlGaAs/GaAs laser diodes grown on Si substrates
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説明
We have studied the rapid degradation of the AlGaAs/GaAs single quantum well laser diodes on Si substrates grown by metalorganic chemical vapor deposition. The dislocations propagate at velocities up to ~75 μm/h along 〈100〉 and ~20 μm/h along 〈110〉, which cause an increase in threshold current and a decrease in differential quantum efficiency. The degraded current-voltage characteristic resulted from the defect‐assisted impurity diffusion. The degradation process occurs very rapidly due to the presence of a high density of defects and thermally induced strain.
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収録刊行物
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- APPLIED PHYSICS LETTERS
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APPLIED PHYSICS LETTERS 67 (20), 2995-2997, 1995-11-13
American Institute of Physics
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詳細情報 詳細情報について
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- CRID
- 1050001337491246976
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- NII論文ID
- 120006666879
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- NII書誌ID
- AA00543432
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- ISSN
- 00036951
- 10773118
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- DOI
- 10.1063/1.114930
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- 本文言語コード
- en
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- 資料種別
- journal article
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- データソース種別
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