Photo‐Rewritable Glaring Patterns Composed of Stripe Domains in Nematic Elastomers

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  • Takuya Ohzono
    Research Institute for Advanced Electronics and Photonics National Institute of Advanced Industrial Science and Technology (AIST) 1‐1‐1 Higashi Tsukuba 305‐8565 Japan
  • Emiko Koyama
    Research Institute for Advanced Electronics and Photonics National Institute of Advanced Industrial Science and Technology (AIST) 1‐1‐1 Higashi Tsukuba 305‐8565 Japan

説明

<jats:title>Abstract</jats:title><jats:p>Dynamic ordered micropatterns in polymeric materials provide an effective approach for the on‐demand tuning of optical properties toward a smart optical material. In this study, it is shown that glaring patterns exhibiting strong anisotropic light diffusion can be developed at specific locations in nematic liquid‐crystal elastomers with light‐sensitive azobenzene units. Glaring originates from the stripe domains of the nematic directors that self‐organize in light‐irradiated regions after a simple uniaxial stretching and releasing process without any complicated lithographic technique. The nematic order transiently reduced by the photo‐induced cis azobenzene isomers unlocks entropic elasticity, which induces local uniaxial shrinkage that causes buckling of the directors forming stripe domains. The written pattern on the film is tangibly visible with the backlight owing to the difference in anisotropic light diffusion. Furthermore, this pattern can be erased by light irradiation or thermal annealing. These films can be applied to optical elements for achieving augmented luminaries, security labeling, and sign‐sheeting applications.</jats:p>

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