Tuning Hyrbrid Ferroelectric and Antiferroelectric Stacks for Low Power FeFET and FeRAM Applications by Using Laminated HSO and HZO films

  • Tarek Ali
    Fraunhofer IPMS Center Nanoelectronic Technologies (CNT) Königsbrücker Str. 178 01099 Dresden Germany
  • David Lehninger
    Fraunhofer IPMS Center Nanoelectronic Technologies (CNT) Königsbrücker Str. 178 01099 Dresden Germany
  • Maximilian Lederer
    Fraunhofer IPMS Center Nanoelectronic Technologies (CNT) Königsbrücker Str. 178 01099 Dresden Germany
  • Songrui Li
    Fraunhofer IPMS Center Nanoelectronic Technologies (CNT) Königsbrücker Str. 178 01099 Dresden Germany
  • Kati Kühnel
    Fraunhofer IPMS Center Nanoelectronic Technologies (CNT) Königsbrücker Str. 178 01099 Dresden Germany
  • Clemens Mart
    Fraunhofer IPMS Center Nanoelectronic Technologies (CNT) Königsbrücker Str. 178 01099 Dresden Germany
  • Konstantin Mertens
    Fraunhofer IPMS Center Nanoelectronic Technologies (CNT) Königsbrücker Str. 178 01099 Dresden Germany
  • Raik Hoffmann
    Fraunhofer IPMS Center Nanoelectronic Technologies (CNT) Königsbrücker Str. 178 01099 Dresden Germany
  • Ricardo Olivo
    Fraunhofer IPMS Center Nanoelectronic Technologies (CNT) Königsbrücker Str. 178 01099 Dresden Germany
  • Jennifer Emara
    Fraunhofer IPMS Center Nanoelectronic Technologies (CNT) Königsbrücker Str. 178 01099 Dresden Germany
  • Kati Biedermann
    Fraunhofer IPMS Center Nanoelectronic Technologies (CNT) Königsbrücker Str. 178 01099 Dresden Germany
  • Joachim Metzger
    GLOBALFOUNDRIES Fab1 LLC and Co. KG Wilschdorfer Land Str. 101 01109 Dresden Germany
  • Robert Binder
    GLOBALFOUNDRIES Fab1 LLC and Co. KG Wilschdorfer Land Str. 101 01109 Dresden Germany
  • Malte Czernohorsky
    Fraunhofer IPMS Center Nanoelectronic Technologies (CNT) Königsbrücker Str. 178 01099 Dresden Germany
  • Thomas Kämpfe
    Fraunhofer IPMS Center Nanoelectronic Technologies (CNT) Königsbrücker Str. 178 01099 Dresden Germany
  • Johannes Müller
    GLOBALFOUNDRIES Fab1 LLC and Co. KG Wilschdorfer Land Str. 101 01109 Dresden Germany
  • Konrad Seidel
    Fraunhofer IPMS Center Nanoelectronic Technologies (CNT) Königsbrücker Str. 178 01099 Dresden Germany
  • Lukas M. Eng
    Institut für Angewandte Physik Technische Universität Dresden Nöthnitzer Str. 61 01187 Dresden Germany

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説明

<jats:title>Abstract</jats:title><jats:p>The properties of hybrid ferroelectric (FE) and antiFE (AFE) films integrated in a single capacitor stack is reported. The stack lamination (4 <jats:bold>×</jats:bold> 5 nm) or (2 <jats:bold>×</jats:bold> 10 nm) using an Alumina (Al<jats:sub>2</jats:sub>O<jats:sub>3</jats:sub>) interlayer, material type (Si‐doped HfO<jats:sub>2</jats:sub> (HSO) and Zr doped HfO<jats:sub>2</jats:sub> (HZO)), precursor condition (TEMA‐Hf and Hf/ZrCl<jats:sub>4</jats:sub>), or dopant concentration (Si and Zr) are investigated for laminate stack properties. Optimized FE properties (higher 2<jats:italic>P</jats:italic><jats:sub>r</jats:sub> and a lower fraction of the monoclinic phase) are observed at (2 <jats:bold>×</jats:bold> 10 nm) laminates compared to a single 20 nm film thickness. The hybrid laminate stack as FE‐FE, AFE‐FE, DE‐FE, or DE‐AFE using (2 <jats:bold>×</jats:bold> 10 nm) based laminates are explored in terms of the output FE hysteresis (2<jats:italic>P</jats:italic><jats:sub>r</jats:sub>, 2<jats:italic>E</jats:italic><jats:sub>c</jats:sub>) and structural properties by X‐ray diffraction. The hybrid AFE‐FE stack shows the potential of tailoring the output FE hysteresis 2<jats:italic>E</jats:italic><jats:sub>c</jats:sub> by varying the fraction of the AFE phase. The hybrid AFE‐FE stack is studied for the HSO and HZO materials at optimal FE content for the first laminate layer while varying the Si or Zr content to stabilize different degrees of an AFE phase in the second laminate layer. The superposition of the hybrid AFE‐FE hysteresis shows a systematic 2<jats:italic>E</jats:italic><jats:sub>c</jats:sub> control. A model is developed to describe the tailored output FE hysteresis via the tuning of a hybrid AFE‐FE stack. The role of stack lamination at hybrid‐stabilized phases inside a single stack is explored with the aim for a controlled and optimized FE hysteresis shape toward a low power (2<jats:italic>E</jats:italic><jats:sub>c</jats:sub>) operation.</jats:p>

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