Tuning Hyrbrid Ferroelectric and Antiferroelectric Stacks for Low Power FeFET and FeRAM Applications by Using Laminated HSO and HZO films
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- Tarek Ali
- Fraunhofer IPMS Center Nanoelectronic Technologies (CNT) Königsbrücker Str. 178 01099 Dresden Germany
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- David Lehninger
- Fraunhofer IPMS Center Nanoelectronic Technologies (CNT) Königsbrücker Str. 178 01099 Dresden Germany
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- Maximilian Lederer
- Fraunhofer IPMS Center Nanoelectronic Technologies (CNT) Königsbrücker Str. 178 01099 Dresden Germany
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- Songrui Li
- Fraunhofer IPMS Center Nanoelectronic Technologies (CNT) Königsbrücker Str. 178 01099 Dresden Germany
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- Kati Kühnel
- Fraunhofer IPMS Center Nanoelectronic Technologies (CNT) Königsbrücker Str. 178 01099 Dresden Germany
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- Clemens Mart
- Fraunhofer IPMS Center Nanoelectronic Technologies (CNT) Königsbrücker Str. 178 01099 Dresden Germany
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- Konstantin Mertens
- Fraunhofer IPMS Center Nanoelectronic Technologies (CNT) Königsbrücker Str. 178 01099 Dresden Germany
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- Raik Hoffmann
- Fraunhofer IPMS Center Nanoelectronic Technologies (CNT) Königsbrücker Str. 178 01099 Dresden Germany
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- Ricardo Olivo
- Fraunhofer IPMS Center Nanoelectronic Technologies (CNT) Königsbrücker Str. 178 01099 Dresden Germany
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- Jennifer Emara
- Fraunhofer IPMS Center Nanoelectronic Technologies (CNT) Königsbrücker Str. 178 01099 Dresden Germany
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- Kati Biedermann
- Fraunhofer IPMS Center Nanoelectronic Technologies (CNT) Königsbrücker Str. 178 01099 Dresden Germany
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- Joachim Metzger
- GLOBALFOUNDRIES Fab1 LLC and Co. KG Wilschdorfer Land Str. 101 01109 Dresden Germany
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- Robert Binder
- GLOBALFOUNDRIES Fab1 LLC and Co. KG Wilschdorfer Land Str. 101 01109 Dresden Germany
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- Malte Czernohorsky
- Fraunhofer IPMS Center Nanoelectronic Technologies (CNT) Königsbrücker Str. 178 01099 Dresden Germany
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- Thomas Kämpfe
- Fraunhofer IPMS Center Nanoelectronic Technologies (CNT) Königsbrücker Str. 178 01099 Dresden Germany
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- Johannes Müller
- GLOBALFOUNDRIES Fab1 LLC and Co. KG Wilschdorfer Land Str. 101 01109 Dresden Germany
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- Konrad Seidel
- Fraunhofer IPMS Center Nanoelectronic Technologies (CNT) Königsbrücker Str. 178 01099 Dresden Germany
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- Lukas M. Eng
- Institut für Angewandte Physik Technische Universität Dresden Nöthnitzer Str. 61 01187 Dresden Germany
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説明
<jats:title>Abstract</jats:title><jats:p>The properties of hybrid ferroelectric (FE) and antiFE (AFE) films integrated in a single capacitor stack is reported. The stack lamination (4 <jats:bold>×</jats:bold> 5 nm) or (2 <jats:bold>×</jats:bold> 10 nm) using an Alumina (Al<jats:sub>2</jats:sub>O<jats:sub>3</jats:sub>) interlayer, material type (Si‐doped HfO<jats:sub>2</jats:sub> (HSO) and Zr doped HfO<jats:sub>2</jats:sub> (HZO)), precursor condition (TEMA‐Hf and Hf/ZrCl<jats:sub>4</jats:sub>), or dopant concentration (Si and Zr) are investigated for laminate stack properties. Optimized FE properties (higher 2<jats:italic>P</jats:italic><jats:sub>r</jats:sub> and a lower fraction of the monoclinic phase) are observed at (2 <jats:bold>×</jats:bold> 10 nm) laminates compared to a single 20 nm film thickness. The hybrid laminate stack as FE‐FE, AFE‐FE, DE‐FE, or DE‐AFE using (2 <jats:bold>×</jats:bold> 10 nm) based laminates are explored in terms of the output FE hysteresis (2<jats:italic>P</jats:italic><jats:sub>r</jats:sub>, 2<jats:italic>E</jats:italic><jats:sub>c</jats:sub>) and structural properties by X‐ray diffraction. The hybrid AFE‐FE stack shows the potential of tailoring the output FE hysteresis 2<jats:italic>E</jats:italic><jats:sub>c</jats:sub> by varying the fraction of the AFE phase. The hybrid AFE‐FE stack is studied for the HSO and HZO materials at optimal FE content for the first laminate layer while varying the Si or Zr content to stabilize different degrees of an AFE phase in the second laminate layer. The superposition of the hybrid AFE‐FE hysteresis shows a systematic 2<jats:italic>E</jats:italic><jats:sub>c</jats:sub> control. A model is developed to describe the tailored output FE hysteresis via the tuning of a hybrid AFE‐FE stack. The role of stack lamination at hybrid‐stabilized phases inside a single stack is explored with the aim for a controlled and optimized FE hysteresis shape toward a low power (2<jats:italic>E</jats:italic><jats:sub>c</jats:sub>) operation.</jats:p>
収録刊行物
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- Advanced Electronic Materials
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Advanced Electronic Materials 8 (5), 2100837-, 2022-01-05
Wiley