Negative ion production and beam extraction processes in a large ion source (invited)
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- K. Tsumori
- National Institute for Fusion Science 1 , 322-6 Oroshi, Toki, Gifu 509-5292, Japan
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- K. Ikeda
- National Institute for Fusion Science 1 , 322-6 Oroshi, Toki, Gifu 509-5292, Japan
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- H. Nakano
- National Institute for Fusion Science 1 , 322-6 Oroshi, Toki, Gifu 509-5292, Japan
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- M. Kisaki
- National Institute for Fusion Science 1 , 322-6 Oroshi, Toki, Gifu 509-5292, Japan
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- S. Geng
- The Graduate University for Advanced Studies 2 , Shonan Village, Hayama, Kanagawa 240-0193, Japan
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- M. Wada
- Doshisha University 3 Graduate School of Science and Engineering, , Kyotanabe, Kyoto 610-0321, Japan
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- K. Sasaki
- Hokkaido University 4 Division of Quantum Science and Engineering, , Sapporo 060-8628, Japan
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- S. Nishiyama
- Hokkaido University 4 Division of Quantum Science and Engineering, , Sapporo 060-8628, Japan
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- M. Goto
- National Institute for Fusion Science 1 , 322-6 Oroshi, Toki, Gifu 509-5292, Japan
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- G. Serianni
- Plasma Engineering Group 5 , Consorzio RFX, Corso Stati Uniti 4, 35127 Padova, Italy
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- P. Agostinetti
- Plasma Engineering Group 5 , Consorzio RFX, Corso Stati Uniti 4, 35127 Padova, Italy
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- E. Sartori
- Plasma Engineering Group 5 , Consorzio RFX, Corso Stati Uniti 4, 35127 Padova, Italy
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- M. Brombin
- Plasma Engineering Group 5 , Consorzio RFX, Corso Stati Uniti 4, 35127 Padova, Italy
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- P. Veltri
- Plasma Engineering Group 5 , Consorzio RFX, Corso Stati Uniti 4, 35127 Padova, Italy
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- C. Wimmer
- Bereich ITER-Technologie und -Diagnostik/N-NBI Boltzmannstr. 2 6 Max-Planck-Institut für Plasmaphysik, , 85748 Garching, Germany
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- K. Nagaoka
- National Institute for Fusion Science 1 , 322-6 Oroshi, Toki, Gifu 509-5292, Japan
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- M. Osakabe
- National Institute for Fusion Science 1 , 322-6 Oroshi, Toki, Gifu 509-5292, Japan
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- Y. Takeiri
- National Institute for Fusion Science 1 , 322-6 Oroshi, Toki, Gifu 509-5292, Japan
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- O. Kaneko
- National Institute for Fusion Science 1 , 322-6 Oroshi, Toki, Gifu 509-5292, Japan
抄録
<jats:p>Recent research results on negative-ion-rich plasmas in a large negative ion source have been reviewed. Spatial density and flow distributions of negative hydrogen ions (H−) and positive hydrogen ions together with those of electrons are investigated with a 4-pin probe and a photodetachment (PD) signal of a Langmuir probe. The PD signal is converted to local H− density from signal calibration to a scanning cavity ring down PD measurement. Introduction of Cs changes the slope of plasma potential local distribution depending upon the plasma grid bias. A higher electron density H2 plasma locally shields the bias potential and behaves like a metallic free electron gas. On the other hand, the bias and extraction electric fields penetrate in a Cs-seeded electronegative plasma even when the electron density is similar. Electrons are transported by the penetrated electric fields from the driver region along and across the filter and electron deflection magnetic fields. Plasma ions exhibited a completely different response against the penetration of electric fields.</jats:p>
収録刊行物
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- Review of Scientific Instruments
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Review of Scientific Instruments 87 (2), 02B936-, 2016-01-07
AIP Publishing
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詳細情報 詳細情報について
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- CRID
- 1360567183869614080
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- ISSN
- 10897623
- 00346748
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- データソース種別
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- Crossref
- KAKEN