Combined pulsed laser deposition and non-contact atomic force microscopy system for studies of insulator metal oxide thin films
説明
<jats:p>We have designed and developed a combined system of pulsed laser deposition (PLD) and non-contact atomic force microscopy (NC-AFM) for observations of insulator metal oxide surfaces. With this system, the long-period iterations of sputtering and annealing used in conventional methods for preparing a metal oxide film surface are not required. The performance of the combined system is demonstrated for the preparation and high-resolution NC-AFM imaging of atomically flat thin films of anatase TiO<jats:sub>2</jats:sub>(001) and LaAlO<jats:sub>3</jats:sub>(100).</jats:p>
収録刊行物
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- Beilstein Journal of Nanotechnology
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Beilstein Journal of Nanotechnology 9 686-692, 2018-02-21
Beilstein Institut