Microelectromechanical system assembled ion optics: An advance to miniaturization and assembly of electron and ion optics
-
- J. Fox
- University of North Texas 1 , Denton, Texas 76203 , USA
-
- R. Saini
- Zyvex 2 , Richardson, Texas 75081 , USA
-
- K. Tsui
- Zyvex 2 , Richardson, Texas 75081 , USA
-
- G. Verbeck
- University of North Texas 1 , Denton, Texas 76203 , USA
書誌事項
- 公開日
- 2009-09-01
- DOI
-
- 10.1063/1.3222980
- 公開者
- AIP Publishing
この論文をさがす
説明
<jats:p>Deep-reactive ion etching of n-doped silicon-on-insulator is utilized to make ion optical components to aid in the miniaturization of mass analyzers. The microelectromechanical system components are bound to aluminum nitride substrates and employed three-dimensional assembly. The assembly methods are tested for breakdown (Vb), durability, and alignment. Demonstration of ion manipulation is shown with a 1 mm Bradbury–Nielsen gate, 500 μm Einzel lens, 500 μm coaxial ring ion trap, and reflectron optics. Data are presented showing the resolution, attenuation, and performance of each of these devices. We demonstrate advantages and disadvantages of this technology and its applications to mass analysis.</jats:p>
収録刊行物
-
- Review of Scientific Instruments
-
Review of Scientific Instruments 80 (9), 2009-09-01
AIP Publishing