Plasma etch chemistry of aluminum and aluminum alloy films

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Dennis W. Hess

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CiNii Books

Journal

Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing 2 (2), 141-155, 1982-06

Springer Science and Business Media LLC

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Details 詳細情報について

CRID

1360574094677256320
DOI

10.1007/bf00633130
ISSN

15728986

02724324
Web Site

http://link.springer.com/content/pdf/10.1007/BF00633130.pdf

http://link.springer.com/article/10.1007/BF00633130/fulltext.html

http://link.springer.com/content/pdf/10.1007/BF00633130
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