Application of dichromated gelatin for dry developed lithographic techniques on GaAs

  • J. M. Villalvilla
    Departamento de Fı́sica Aplicada, Universidad de Alicante, E-03080 Alicante, Spain
  • J. A. Vallés-Abarca
    Departamento de Fı́sica Aplicada, Universidad de Alicante, E-03080 Alicante, Spain
  • J. A. Quintana
    Departamento de Fı́sica Aplicada, Universidad de Alicante, E-03080 Alicante, Spain
  • J. Crespo
    Departamento de Fı́sica Aplicada, Universidad de Alicante, E-03080 Alicante, Spain

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<jats:p>Dichromated gelatin developed in an O2 plasma is used as a negative resist to transfer patterns onto GaAs. After reactive ion etching, the results show a 10:1 aspect ratio with no gelatin residue when 1 μm period structures are transferred.</jats:p>

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