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Photodesorption studies of CO2 from an oxygen-saturated silicon(100) surface
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- Nguyen Van Hieu
- Physics Department and Surface Studies Laboratory, University of Wisconsin-Milwaukee, Milwaukee, Wisconsin 53201
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- David Lichtman
- Physics Department and Surface Studies Laboratory, University of Wisconsin-Milwaukee, Milwaukee, Wisconsin 53201
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Description
<jats:p>Photodesorption from an oxygen-saturated silicon(100) surface was studied with photons of wavelength 250–1100 nm. The desorbing species were monitored with a mass spectrometer over the mass range of 2 (H2) to 44 (CO2). Only CO2 was observed to desorb with a threshold value of ∼2.76 eV, and the desorbing signal was linearly dependent on the incident photon intensity. Perhaps most important, the photodesorption activity decreases markedly with the controlled decrease of surface impurity carbon content.</jats:p>
Journal
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- Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 1 (1), 1-6, 1983-01-01
American Vacuum Society
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Details 詳細情報について
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- CRID
- 1360579816431059968
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- DOI
- 10.1116/1.572303
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- ISSN
- 15208559
- 07342101
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- Data Source
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- Crossref