Photodesorption studies of CO2 from an oxygen-saturated silicon(100) surface

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  • Nguyen Van Hieu
    Physics Department and Surface Studies Laboratory, University of Wisconsin-Milwaukee, Milwaukee, Wisconsin 53201
  • David Lichtman
    Physics Department and Surface Studies Laboratory, University of Wisconsin-Milwaukee, Milwaukee, Wisconsin 53201

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<jats:p>Photodesorption from an oxygen-saturated silicon(100) surface was studied with photons of wavelength 250–1100 nm. The desorbing species were monitored with a mass spectrometer over the mass range of 2 (H2) to 44 (CO2). Only CO2 was observed to desorb with a threshold value of ∼2.76 eV, and the desorbing signal was linearly dependent on the incident photon intensity. Perhaps most important, the photodesorption activity decreases markedly with the controlled decrease of surface impurity carbon content.</jats:p>

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