Effects of substrate self-bias and nitrogen flow rate on non-polar AlN film growth by reactive sputtering

詳細情報 詳細情報について

• CRID

  1360847874812685056

• NII論文ID

  210000156155

• DOI

  10.7567/1347-4065/ab088f

• ISSN

  13474065

  00214922

• Web Site

  https://iopscience.iop.org/article/10.7567/1347-4065/ab088f/pdf

  https://iopscience.iop.org/article/10.7567/1347-4065/ab088f

• データソース種別

  • Crossref
  • CiNii Articles