Characteristics of TiO<sub>2</sub>Thin Film Surfaces Treated by Helium and Air Dielectric Barrier Discharge Plasmas
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 51 (8S1), 08HB04-, 2012-08-01
IOP Publishing
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詳細情報 詳細情報について
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- CRID
- 1360847874815983488
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- NII論文ID
- 210000141079
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- ISSN
- 13474065
- 00214922
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- データソース種別
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- Crossref
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