Characteristics of TiO<sub>2</sub>Thin Film Surfaces Treated by Helium and Air Dielectric Barrier Discharge Plasmas

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Details 詳細情報について

  • CRID
    1360847874815983488
  • NII Article ID
    210000141079
  • DOI
    10.7567/jjap.51.08hb04
  • ISSN
    13474065
    00214922
  • Data Source
    • Crossref
    • CiNii Articles

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