Three-step phase-shifting imaging ellipsometry to measure nanofilm thickness profiles
書誌事項
- 公開日
- 2019-01
- 資源種別
- journal article
- 権利情報
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- https://www.elsevier.com/tdm/userlicense/1.0/
- DOI
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- 10.1016/j.optlaseng.2018.09.005
- 公開者
- Elsevier BV
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説明
Abstract Three-step phase-shifting imaging ellipsometry is proposed for the dynamic measurement of a nanofilm's thickness profile in two dimensions. The designed apparatus consists of an ellipsometric optical configuration and an image-processing unit to perform phase-shifting imaging ellipsometry measurements, a key technique used to achieve dynamic and two-dimensional measurements. The uncertainties of the ellipsometric parameters ψ and Δ were evaluated based on the developed optical system and the proposed three-step phase-shifting technique. The thickness profile of a SiO2 nanofilm on a silicon substrate was measured to calibrate the proposed apparatus; results were comparable to those obtained by a commercial spectroscopic ellipsometer. The measured thickness profiles are almost flat over the area of 1.10 mm × 2.21 mm with the spatial resolutions of 1.58 and 4.62 μm in the horizontal and vertical directions, respectively. The differences of average thickness between the proposed apparatus and a commercial spectroscopic ellipsometer were less than 3 nm. Furthermore, measurement precision was validated by obtaining a standard deviation of less than 2.5 nm.
収録刊行物
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- Optics and Lasers in Engineering
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Optics and Lasers in Engineering 112 145-150, 2019-01
Elsevier BV
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詳細情報 詳細情報について
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- CRID
- 1360848657343675008
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- ISSN
- 01438166
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- 資料種別
- journal article
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- データソース種別
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- KAKEN
- OpenAIRE