Nanoscale scratching of platinum thin films using atomic force microscopy with DLC tips
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- Xiaohong Jiang
- Henan University Key Laboratory of Special Functional Materials of Ministry of Education, , Kaifeng 475004, People’s Republic of China
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- Guoyun Wu
- Henan University Key Laboratory of Special Functional Materials of Ministry of Education, , Kaifeng 475004, People’s Republic of China
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- Zuliang Du
- Henan University Key Laboratory of Special Functional Materials of Ministry of Education, , Kaifeng 475004, People’s Republic of China
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- Keng-Jeng Ma
- Chung Hua University Department of Mechanical Engineering, , Hsinchu, Taiwan 30012
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- Jun-ichi Shirakashi
- Tokyo University of Agriculture and Technology Department of Electrical and Electronic Engineering, , Tokyo 184–8588, Japan
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- Ampere A. Tseng
- Brno University of Technology Faculty of Mechanical Engineering, , Brno, Czech Republic
書誌事項
- 公開日
- 2012-03-01
- 資源種別
- journal article
- DOI
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- 10.1116/1.3694242
- 公開者
- American Vacuum Society
この論文をさがす
説明
<jats:p>Atomic force microscopy experiments were conducted to investigate the scratching characteristics of platinum thin-films for making microscale or nanoscale structures. The wear behavior of the diamond-like-carbon coated tip used was first studied to quantify the wear rate for scratching Pt films. The influences of the scratching parameters on the resulting geometries were then investigated. The scratching parameters to be considered included the applied tip force, number of scratch cycles, and scratch speed. All results indicated that the scratched groove size could be well correlated with and precisely controlled by the applied force and the scratch cycle number. With the aid of the correlation parameters and the known tip wear rate, the scratched geometry can be better controlled and fabricated. The associated scratchability, which is a measure of the easiness of the material to be removed by scratching, can also be determined.</jats:p>
収録刊行物
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- Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
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Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 30 (2), 2012-03-01
American Vacuum Society
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詳細情報 詳細情報について
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- CRID
- 1360848660799779328
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- ISSN
- 21662754
- 21662746
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- 資料種別
- journal article
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- データソース種別
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- Crossref
- KAKEN
- OpenAIRE