Persistence of the Topological Surface States in Bi<sub>2</sub>Se<sub>3</sub> against Ag Intercalation at Room Temperature
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- Mao Ye
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, 865 Chang Ning Road, Shanghai, 200050, China
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- Kenta Kuroda
- Graduate School of Science, Hiroshima University, 1-3-1 Kagamiyama, Higashi-Hiroshima, 739-8526, Japan
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- Mikhail M. Otrokov
- Centro de Física de Materiales (CFM-MPC), Centro Mixto CSIC-UPV/EHU, Donostia-San Sebastián, Basque Country 20018, Spain
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- Anastasia G. Ryabishchenkova
- Tomsk State University, Tomsk, 634050, Russia
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- Qi Jiang
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, 865 Chang Ning Road, Shanghai, 200050, China
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- Arthur Ernst
- Institut für Theoretische Physik, Johannes Kepler Universität, Linz, A 4040, Austria
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- Evgueni V. Chulkov
- Donostia International Physics Center (DIPC), Donostia-San Sebastián, Basque Country 20018, Spain
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- Masashi Nakatake
- Hiroshima Synchrotron Radiation Center, Hiroshima University, 2-313 Kagamiyama, Higashi-Hiroshima, 739-0046, Japan
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- Masashi Arita
- Hiroshima Synchrotron Radiation Center, Hiroshima University, 2-313 Kagamiyama, Higashi-Hiroshima, 739-0046, Japan
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- Taichi Okuda
- Hiroshima Synchrotron Radiation Center, Hiroshima University, 2-313 Kagamiyama, Higashi-Hiroshima, 739-0046, Japan
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- Tomohiro Matsushita
- Nara Institute of Science and Technology (NAIST), 8916-5 Takayama, Ikoma, Nara 630-0192, Japan
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- László Tóth
- Nara Institute of Science and Technology (NAIST), 8916-5 Takayama, Ikoma, Nara 630-0192, Japan
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- Hiroshi Daimon
- Nara Institute of Science and Technology (NAIST), 8916-5 Takayama, Ikoma, Nara 630-0192, Japan
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- Kenya Shimada
- Hiroshima Synchrotron Radiation Center, Hiroshima University, 2-313 Kagamiyama, Higashi-Hiroshima, 739-0046, Japan
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- Yoshifumi Ueda
- Kure National College of Technology, Agaminami 2-2-11, Kure, 737-8506, Japan
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- Akio Kimura
- Graduate School of Science, Hiroshima University, 1-3-1 Kagamiyama, Higashi-Hiroshima, 739-8526, Japan
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説明
The electronic and atomic structures of topological insulator Bi2Se3, upon Ag atom deposition, have been investigated by combined experimental methods of scanning tunneling microscopy (STM), photoelectron spectroscopy, and first-principles calculations. We show from the results of STM that the deposited Ag atoms are stabilized beneath the surface instead of being adsorbed on the topmost surface. We further reveal from the angle-resolved photoemission spectroscopy that the Bi2Se3(0001) topological surface states stay uninterrupted after a large amount of absorption of Ag atoms. Our analysis of the photoelectron intensity of Ag core states excited by soft X-ray suggests that a large amount of deposited Ag atoms diffused into a deeper place, which is beyond the probing depth of X-ray photoelectron spectroscopy. The first-principles calculations identify the octahedral site in the van der Waals gaps between quintuple layers to be the most favorable locations of Ag atoms beneath the surface, which yields good agreement between the simulated and experimental STM images. These findings pave an efficient way to tailor the local lattice structures of topological insulators without disturbing the topologically nontrivial surface states. This work was partially supported by National Key R&D Program of China (2017YFA0305400). We also acknowledge the financial support by KAKENHI (Grant No. 17H06138, No. 18H03683). The photoemission and STM/STS experiment were performed with the approval of the Proposal Assessing Committee of HSRC (Proposal Nos.11-B-40, 12-B-12), Hiroshima University, Japan. The XPD measurement was conducted at SPring-8 with the approval of the Proposal Assessing Committee of Institute for Solid State Physics, the University of Tokyo (JASRI Proposals Nos. 2012A7427, 2010B7411, 2011A7412, 2011B7421). We thank Dr. Hiroyuki Matsuda for the technical support and instruction during the XPD experiments. The supports by the Diputación Foral de Gipuzkoa (Project No. 2018-CIEN-000025-01), Spanish Ministerio de Ciencia e Innovación (Grant No. PID2019-103910GB-I00) and the Saint Petersburg State University grant for scientific investigations (ID No. 51126254) are also acknowledged. DFT calculations of atomic structure carried out by A.G.R. within the Russian Science Foundation Grant No.19-72-30023. A.E. acknowledges the support by the German Research Foundation (DFG) in the framework of the Special Priority Program (SPP 1666) ”Topological Insulators”. Peer reviewed
収録刊行物
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- The Journal of Physical Chemistry C
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The Journal of Physical Chemistry C 125 (3), 1784-1792, 2021-01-13
American Chemical Society (ACS)
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詳細情報 詳細情報について
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- CRID
- 1360857593669793024
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- ISSN
- 19327455
- 19327447
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- 資料種別
- journal article
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- KAKEN
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