Fabrication of three-dimensional photonic crystal with alignment based on electron beam lithography
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- G. Subramania
- Sandia National Laboratories , P.O. Box 5800, Albuquerque, New Mexico 87185
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- S. Y. Lin
- Sandia National Laboratories , P.O. Box 5800, Albuquerque, New Mexico 87185
書誌事項
- 公開日
- 2004-11-22
- DOI
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- 10.1063/1.1825623
- 公開者
- AIP Publishing
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説明
<jats:p>We demonstrate the fabrication of a three-dimensional woodpile photonic crystal in the near-infrared using a layer-by-layer approach involving electron beam lithography and spin on glass planarization. The alignment accuracy between the first and the fifth layer is within 10% of the lattice spacing as measured from cross section scanning-electron-microscopy images. Optical reflectivity measurements reveal peaks consistent with the photonic gap frequency. The method offers a way of rapid prototyping full three-dimensional photonic band gap devices with considerable flexibility of materials choice. Moreover, lattice structure that can operate at wavelengths into the visible can be fabricated using this approach.</jats:p>
収録刊行物
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- Applied Physics Letters
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Applied Physics Letters 85 (21), 5037-5039, 2004-11-22
AIP Publishing