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- Zai-Quan Xu
- School of Mathematical and Physical Sciences
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- Christopher Elbadawi
- School of Mathematical and Physical Sciences
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- Toan Trong Tran
- School of Mathematical and Physical Sciences
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- Mehran Kianinia
- School of Mathematical and Physical Sciences
-
- Xiuling Li
- School of Chemistry and Materials Sciences
-
- Daobin Liu
- School of Chemistry and Materials Sciences
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- Timothy B. Hoffman
- Department of Chemical Engineering
-
- Minh Nguyen
- School of Mathematical and Physical Sciences
-
- Sejeong Kim
- School of Mathematical and Physical Sciences
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- James H. Edgar
- Department of Chemical Engineering
-
- Xiaojun Wu
- School of Chemistry and Materials Sciences
-
- Li Song
- School of Chemistry and Materials Sciences
-
- Sajid Ali
- School of Mathematical and Physical Sciences
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- Mike Ford
- School of Mathematical and Physical Sciences
-
- Milos Toth
- School of Mathematical and Physical Sciences
-
- Igor Aharonovich
- School of Mathematical and Physical Sciences
書誌事項
- 公開日
- 2018
- 権利情報
-
- http://rsc.li/journals-terms-of-use#chorus
- DOI
-
- 10.1039/c7nr08222c
- 公開者
- Royal Society of Chemistry (RSC)
この論文をさがす
説明
<p>Ar plasma etching and annealing are highly robust in generating oxygen related single photon emitters in hBN.</p>
収録刊行物
-
- Nanoscale
-
Nanoscale 10 (17), 7957-7965, 2018
Royal Society of Chemistry (RSC)