Monochromatic imaging and angular distribution measurements of extreme ultraviolet light from laser-produced Sn and SnO2 plasmas

DOI PDF 被引用文献5件
  • Y. Tao
    Institute of Laser Engineering, Osaka University , 2-6 Yamada-oka, Suita, Osaka 565-0871, Japan
  • F. Sohbatzadeh
    Physics Department and Laser Research Institute, Shahid Beheshti University , Evin, Tehran, Iran
  • H. Nishimura
    Institute of Laser Engineering, Osaka University , 2-6 Yamada-oka, Suita, Osaka 565-0871, Japan
  • R. Matsui
    Institute of Laser Engineering, Osaka University , 2-6 Yamada-oka, Suita, Osaka 565-0871, Japan
  • T. Hibino
    Institute of Laser Engineering, Osaka University , 2-6 Yamada-oka, Suita, Osaka 565-0871, Japan
  • T. Okuno
    Institute of Laser Engineering, Osaka University , 2-6 Yamada-oka, Suita, Osaka 565-0871, Japan
  • S. Fujioka
    Institute of Laser Engineering, Osaka University , 2-6 Yamada-oka, Suita, Osaka 565-0871, Japan
  • K. Nagai
    Institute of Laser Engineering, Osaka University , 2-6 Yamada-oka, Suita, Osaka 565-0871, Japan
  • T. Norimatsu
    Institute of Laser Engineering, Osaka University , 2-6 Yamada-oka, Suita, Osaka 565-0871, Japan
  • K. Nishihara
    Institute of Laser Engineering, Osaka University , 2-6 Yamada-oka, Suita, Osaka 565-0871, Japan
  • N. Miyanaga
    Institute of Laser Engineering, Osaka University , 2-6 Yamada-oka, Suita, Osaka 565-0871, Japan
  • Y. Izawa
    Institute of Laser Engineering, Osaka University , 2-6 Yamada-oka, Suita, Osaka 565-0871, Japan
  • A. Sunahara
    Institute for Laser Technology , Suita, Osaka, 565-0871, Japan
  • T. Kawamura
    Institute for Laser Technology , Suita, Osaka, 565-0871, Japan

書誌事項

公開日
2004-09-13
DOI
  • 10.1063/1.1788878
公開者
AIP Publishing

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説明

<jats:p>Properties of extreme ultraviolet (EUV) emission from laser-produced Sn and SnO2 plasmas were investigated. EUV emission images were taken with a monochromatic imager for 13.5nm with 4% bandwidth. It was found that the EUV emitting plasma is not formed symmetrically with respect to the target surface normal but extends toward laser incident axis. This result is consistent with the angular distribution of EUV emission peaked toward the direction nearly perpendicular to the laser axis. The asymmetric plasma can be attributed to the interaction of a long laser pulse with expanding plasma along the path of laser incidence.</jats:p>

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