-
- J. P. Stagg
- Philips Research Laboratories, Redhill, Surrey, England
書誌事項
- 公開日
- 1977-10-15
- DOI
-
- 10.1063/1.89766
- 公開者
- AIP Publishing
この論文をさがす
説明
<jats:p>Na+ and K+ ion mobilities in thermally grown SiO2 films have been determined from transient ion curret measurements in MOS capacitors. The mobilities were determined from the observed transit times of Na+ and K+ ions measured in the temperature ranges 40–180 °C and 230–300 °C, respectively. For Na+ ions in both a dry-grown oxide and one grown in a 10% HCl/oxygen mixture, μ=1.0 exp(−0.66 eV/kT) cm2/V sec. For K+ ions in a dry-grown oxide, μ=0.03 exp(−1.09 eV/kT) cm2/V sec.</jats:p>
収録刊行物
-
- Applied Physics Letters
-
Applied Physics Letters 31 (8), 532-533, 1977-10-15
AIP Publishing
- Tweet
詳細情報 詳細情報について
-
- CRID
- 1361418519310653568
-
- DOI
- 10.1063/1.89766
-
- ISSN
- 10773118
- 00036951
-
- データソース種別
-
- Crossref

