Plasma Polymerized Films for Sensor Devices

Atsunori Hiratsuka, Isao Karube

doi:10.1002/1521-4109(200005)12:9<695::aid-elan695>3.0.co;2-4

Plasma Polymerized Films for Sensor Devices

DOI Web Site Web Site 被引用文献1件

書誌事項

公開日: 2000-05

権利情報

http://doi.wiley.com/10.1002/tdm_license_1.1

DOI

10.1002/1521-4109(200005)12:9<695::aid-elan695>3.0.co;2-4

公開者: Wiley

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説明

Miniaturization with semiconductor microfabrication or micromachining techniques is one of the main concerns in sensor technologies. For the combination of sensor and microelectronics technology, polymers should be fabricated in a mass-producible and miniaturization-conscious manner as an interface. The polymers fabricated in conventional manners could have potential problems, e.g., obtaining thin (<1 µm) and homogeneous films. Plasma-polymerized films, which are made in a glow discharge or plasma in a vapor phase, offer a new alternative. This review describes the several characteristics, properties, and applications of plasma-polymerized films in both chemical and biological fields.