Chemical Vapor Deposition Growth of Single-Walled Carbon Nanotubes at 600 °C and a Simple Growth Model
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- Robert Seidel
- Infineon Technologies AG, Corporate Research, 81730 Munich, Germany
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- Georg S. Duesberg
- Infineon Technologies AG, Corporate Research, 81730 Munich, Germany
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- Eugen Unger
- Infineon Technologies AG, Corporate Research, 81730 Munich, Germany
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- Andrew P. Graham
- Infineon Technologies AG, Corporate Research, 81730 Munich, Germany
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- Maik Liebau
- Infineon Technologies AG, Corporate Research, 81730 Munich, Germany
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- Franz Kreupl
- Infineon Technologies AG, Corporate Research, 81730 Munich, Germany
書誌事項
- 公開日
- 2004-01-09
- DOI
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- 10.1021/jp037063z
- 公開者
- American Chemical Society (ACS)
この論文をさがす
収録刊行物
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- The Journal of Physical Chemistry B
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The Journal of Physical Chemistry B 108 (6), 1888-1893, 2004-01-09
American Chemical Society (ACS)
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詳細情報 詳細情報について
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- CRID
- 1361418520159219328
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- ISSN
- 15205207
- 15206106
- http://id.crossref.org/issn/10895647
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- データソース種別
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- Crossref