Local atomic structure in thin films of silicon nitride and silicon diimide produced by remote plasma-enhanced chemical-vapor deposition
書誌事項
- 公開日
- 1986-05-15
- 権利情報
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- http://link.aps.org/licenses/aps-default-license
- DOI
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- 10.1103/physrevb.33.7069
- 公開者
- American Physical Society (APS)
この論文をさがす
収録刊行物
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- Physical Review B
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Physical Review B 33 (10), 7069-7076, 1986-05-15
American Physical Society (APS)