Characterization of the negative ion fraction in high-density SF6 magnetoplasmas using ion acoustic waves

DOI PDF 被引用文献2件
  • L. St-Onge
    Groupe de physique des plasmas, Université de Montréal, C. P. 6128, Succursale Centre-ville, Montréal, Québec H3C 3J7, Canada
  • J. Margot
    Groupe de physique des plasmas, Université de Montréal, C. P. 6128, Succursale Centre-ville, Montréal, Québec H3C 3J7, Canada
  • M. Chaker
    INRS Énergie et Matériaux, C. P. 1020, Varennes, Québec J0L 2P0, Canada

書誌事項

公開日
1998-01-19
DOI
  • 10.1063/1.120715
公開者
AIP Publishing

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説明

<jats:p>Most plasmas used in the microelectronics industry are electronegative, i.e., they contain a large number of negative ions. One simple way to characterize the negative-to-positive ion density ratio (n−/n+) in such plasmas is to measure the velocity of ion acoustic waves (IAWs). In this letter, a detailed study of the propagation of IAWs in high-density SF6 magnetoplasmas is given. Results (n−/n+) obtained by way of this technique as functions of different parameters (gas pressure, SF6 content in SF6/Ar mixture, and radial position in the reactor) are compared to those obtained with a more sophisticated technique based on laser photodetachment.</jats:p>

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