Hydroxyl radical-assisted decomposition and oxidation in solution-processed indium oxide thin-film transistors
-
- Mardhiah M. Sabri
- School of Electrical and Electronic Engineering
-
- Joohye Jung
- School of Electrical and Electronic Engineering
-
- Doo Hyun Yoon
- School of Electrical and Electronic Engineering
-
- Seokhyun Yoon
- School of Electrical and Electronic Engineering
-
- Young Jun Tak
- School of Electrical and Electronic Engineering
-
- Hyun Jae Kim
- School of Electrical and Electronic Engineering
書誌事項
- 公開日
- 2015
- DOI
-
- 10.1039/c5tc01457c
- 公開者
- Royal Society of Chemistry (RSC)
この論文をさがす
説明
<p>Solution-processed indium oxide TFTs were fabricated by hydroxyl radical-assisted (HRA) decomposition and oxidation.</p>
収録刊行物
-
- Journal of Materials Chemistry C
-
Journal of Materials Chemistry C 3 (28), 7499-7505, 2015
Royal Society of Chemistry (RSC)
