Analytic model of power deposition in inductively coupled plasma sources

DOI PDF 被引用文献6件
  • V. Vahedi
    Lawrence Livermore National Laboratory, Livermore, California 94550
  • M. A. Lieberman
    Department of Electrical Engineering and Computer Science, University of California, Berkeley, Berkeley, California 94720
  • G. DiPeso
    Lawrence Livermore National Laboratory, Livermore, California 94550
  • T. D. Rognlien
    Lawrence Livermore National Laboratory, Livermore, California 94550
  • D. Hewett
    Lawrence Livermore National Laboratory, Livermore, California 94550

書誌事項

公開日
1995-08-01
DOI
  • 10.1063/1.360723
公開者
AIP Publishing

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説明

<jats:p>A simple analytic model valid for all collisionality regimes is developed to describe the power deposition in a cylindrical inductively coupled plasma source with a planar coil. The heating is ohmic at high pressures and remains finite at low pressures. The low-pressure collisionless heating is due to kinetic nonlocal effects. The model is in good agreement with other calculations of collisionless heating. A diffusion model is then used to determine the plasma density profile and the electron temperature in terms of the gas pressure and the source geometry. The heating and diffusion models are used to determine the scaling of the inductive electric field with applied frequency and input power, and the results are compared with published experimental data to verify the scaling.</jats:p>

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