XPS, AES and Raman Studies of an Antitarnish Film on Tin

  • J.L. Fang
    ⋆Applied Chemistry Institute, Nanjing University, Nanjing 21008, PRC.
  • N.J. Wu
    ⋆⋆Department of Applied Chemistry, Nanjing Institute of Chemical Technology, PRC.
  • Z.W. Wang
    ⋆⋆Department of Applied Chemistry, Nanjing Institute of Chemical Technology, PRC.
  • Y. Li
    ⋆⋆Department of Applied Chemistry, Nanjing Institute of Chemical Technology, PRC.

書誌事項

公開日
1991-03-01
DOI
  • 10.5006/1.3585238
公開者
Association for Materials Protection and Performance (AMPP)

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説明

<jats:p>For protecting tin from tarnishing, ethylenediamine-tetramethyli-dene-phosphonic acid (EDTMP) was found to be more effective than chromate, molybdate, and other agents. A 10-minute treatment in 5 to 10 g/L of EDTMP with a pH of 1 to 4 at 25 to 80°C formed a corrosion-resistant complex film, which was composed of 48.0% 0, 10.7% Sn, 7.7% N, 23.1% C, and 10.5% P, based on x-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) determinations. From differences in the binding energies of Sn, N and O before and after film formation, and from the R−PO32− - and Sn-N vibrations in the Raman spectra for the film it was deduced that N and O in EDTMP were coordinated with Sn in the film.</jats:p>

収録刊行物

  • Corrosion

    Corrosion 47 (3), 169-173, 1991-03-01

    Association for Materials Protection and Performance (AMPP)

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