Enhancement of the third-order nonlinear optical susceptibility in epitaxial vanadyl-phthalocyanine films grown on KBr

  • Shaoli Fang
    Kansai Advanced Research Center, Communications Research Laboratory, 588-2 Iwaoka, Nishiku, Kobe 651-24, Japan
  • Hirokazu Tada
    Kansai Advanced Research Center, Communications Research Laboratory, 588-2 Iwaoka, Nishiku, Kobe 651-24, Japan
  • Shinro Mashiko
    Kansai Advanced Research Center, Communications Research Laboratory, 588-2 Iwaoka, Nishiku, Kobe 651-24, Japan

抄録

<jats:p>We determined the magnitude of the third-order nonlinear optical susceptibilities χ(3)(−3ω; ω, ω, ω) of vanadyl-phthalocyanine (VOPc) films grown on KBr and fused silica substrates, using the third harmonic generation method at a wavelength of 1200 nm. The χ(3) value of the film grown epitaxially on KBr was 2.87×10−10 esu, which was greater by a factor of about 7.7 than that of a polycrystalline film grown on fused silica. The enhancement of χ(3) in the epitaxial phase is associated with the optimized orientation of the two-dimensional π-electron system in the condensed phase.</jats:p>

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