Enhancement of the third-order nonlinear optical susceptibility in epitaxial vanadyl-phthalocyanine films grown on KBr
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- Shaoli Fang
- Kansai Advanced Research Center, Communications Research Laboratory, 588-2 Iwaoka, Nishiku, Kobe 651-24, Japan
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- Hirokazu Tada
- Kansai Advanced Research Center, Communications Research Laboratory, 588-2 Iwaoka, Nishiku, Kobe 651-24, Japan
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- Shinro Mashiko
- Kansai Advanced Research Center, Communications Research Laboratory, 588-2 Iwaoka, Nishiku, Kobe 651-24, Japan
説明
<jats:p>We determined the magnitude of the third-order nonlinear optical susceptibilities χ(3)(−3ω; ω, ω, ω) of vanadyl-phthalocyanine (VOPc) films grown on KBr and fused silica substrates, using the third harmonic generation method at a wavelength of 1200 nm. The χ(3) value of the film grown epitaxially on KBr was 2.87×10−10 esu, which was greater by a factor of about 7.7 than that of a polycrystalline film grown on fused silica. The enhancement of χ(3) in the epitaxial phase is associated with the optimized orientation of the two-dimensional π-electron system in the condensed phase.</jats:p>
収録刊行物
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- Applied Physics Letters
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Applied Physics Letters 69 (6), 767-769, 1996-08-05
AIP Publishing
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詳細情報 詳細情報について
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- CRID
- 1361699995776768768
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- DOI
- 10.1063/1.117885
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- ISSN
- 10773118
- 00036951
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- データソース種別
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- Crossref