Optical strip waveguides in KNbO3 formed by He ion implantation

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  • D. Fluck
    Institute of Quantum Electronics, Swiss Federal Institute of Technology, ETH-Hönggerberg, CH-8093 Zürich, Switzerland
  • P. Günter
    Institute of Quantum Electronics, Swiss Federal Institute of Technology, ETH-Hönggerberg, CH-8093 Zürich, Switzerland
  • R. Irmscher
    ISI-Forschungzentrum (KFA) Jülich, D-5170 Jülich, Germany
  • Ch. Buchal
    ISI-Forschungzentrum (KFA) Jülich, D-5170 Jülich, Germany

説明

<jats:p>Permanent optical strip waveguides in single crystals of KNbO3 were produced with MeV He ion implantation. Guided TE00 modes were observed and the propagation losses were characterized at the wavelengths of 514, 632, and 860 nm. Waveguide propagation losses of 1.4 dB/cm were measured at 632 nm.</jats:p>

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