Nonfaceted Growth of (111)-Oriented Epitaxial Alkali-Halide Crystals via an Ionic Liquid Flux in a Vacuum

DOI Web Site 被引用文献10件
  • Shun Kato
    Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
  • Yoko Takeyama
    Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
  • Shingo Maruyama
    Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
  • Yuji Matsumoto
    Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan

書誌事項

公開日
2010-06-17
DOI
  • 10.1021/cg100493t
公開者
American Chemical Society (ACS)

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説明

Nonfaceted growth of (111)-oriented epitaxial KBr crystals on sapphire single crystal substrates has been achieved using a novel vacuum deposition method of flux-mediated epitaxy, involving the use of ionic liquids as a flux. It was found that the ionic liquid could act as a flux to promote the growth of KBr at higher growth temperatures and to stabilize its unstable polar (111) face with no faceting of the crystal surface. Even after evaporation of the remaining ionic liquid to remove it from the KBr crystals, the atomically flat (111) surface could be preserved without refaceting.

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