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- M. I. B. Bernardi
- Universidade Federal de São Carlos, Brazil
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- E. J. H. Lee
- Universidade Federal de São Carlos, Brazil
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- P. N. Lisboa-Filho
- Universidade Federal de São Carlos, Brazil
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- E. R. Leite
- Universidade Federal de São Carlos, Brazil
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- E. Longo
- Universidade Federal de São Carlos, Brazil
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- A. G. Souza
- UFPB, Brazil
抄録
<jats:p>The synthesis of TiO2 thin films was carried out by the Organometallic Chemical Vapor Deposition (MOCVD) method. The influence of deposition parameters used during growth on the final structural characteristics was studied. A combination of the following experimental parameters was studied: temperature of the organometallic bath, deposition time, and temperature and substrate type. The high influence of those parameters on the final thin film microstructure was analyzed by scanning electron microscopy with electron dispersive X-ray spectroscopy, atomic force microscopy and X-ray diffraction.</jats:p>
収録刊行物
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- Cerâmica
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Cerâmica 48 (305), 38-42, 2002-03
FapUNIFESP (SciELO)