The use of in situ X-ray diffraction, optical scattering and resistance analysis techniques for evaluation of copper diffusion barriers in blanket films and damascene structures
書誌事項
- 公開日
- 2001-10
- 権利情報
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- https://www.elsevier.com/tdm/userlicense/1.0/
- DOI
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- 10.1016/s0040-6090(01)01353-0
- 公開者
- Elsevier BV
この論文をさがす
収録刊行物
-
- Thin Solid Films
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Thin Solid Films 397 (1-2), 194-202, 2001-10
Elsevier BV