Changes in refractive index and in chemical state of synchrotron radiation irradiated fluorinated polyimide films
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- Yasuko Yamada Maruo
- NTT Interdisciplinary Research Laboratories, Musashino-shi, Tokyo 180, Japan
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- Shigekuni Sasaki
- NTT Interdisciplinary Research Laboratories, Musashino-shi, Tokyo 180, Japan
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- Tsuneyuki Haga
- NTT LSI Laboratories, Atsugi, Kanagawa 243-01, Japan
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- Hiroo Kinoshita
- NTT LSI Laboratories, Atsugi, Kanagawa 243-01, Japan
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- Toshiyuki Horiuchi
- NTT LSI Laboratories, Atsugi, Kanagawa 243-01, Japan
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- Toshiaki Tamamura
- NTT Optoelectronics Laboratories, Atsugi, Kanagawa 243-01, Japan
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抄録
<jats:p>Changes in refractive index and in film thickness caused by synchrotron radiation are studied in a fluorinated polyimide (6FDA/TFDB). The index at 589.6 nm increased by 1.3% and the thickness decreased by 0.69% for 8-μm-thick film after 30 min irradiation. X-ray photoelectron spectroscopy analysis was performed on the modified surfaces after synchrotron radiation exposure. From the present data the synchrotron radiation leads to production of a fluorine-poor surface.</jats:p>
収録刊行物
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- Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 14 (4), 2470-2474, 1996-07-01
American Vacuum Society
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詳細情報 詳細情報について
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- CRID
- 1362262944984485504
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- NII論文ID
- 30020299444
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- NII書誌ID
- AA10635514
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- DOI
- 10.1116/1.580003
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- ISSN
- 15208559
- 07342101
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- データソース種別
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- CiNii Articles