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- Luis García‐Fernández
- Max‐Planck‐Institut für Polymerforschung Ackermannweg 10 55128 Mainz Germany
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- Alexandre Specht
- Laboratoire de Conception et Application de Molécules Bioactives UMR 7199, CNRS/UDS, Faculté de Pharmacie, 74 Route du Rhin 67400 ILLKIRCH France
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- Aránzazu del Campo
- Max‐Planck‐Institut für Polymerforschung Ackermannweg 10 55128 Mainz Germany
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説明
<jats:p>Polyurethane (PU) monomer mixtures containing commercially available <jats:italic>o</jats:italic>‐nitrobenzyl‐based photocleavable monomers have been formulated and tested as low‐cost positive tone photoresists. The photolysis reaction is studied by UV spectroscopy. Well‐defined micropatterns on 2 μm thick photodegradable PU films are obtained using 365 nm light exposure. This strategy is also extended to improved formulations based on synthesized <jats:italic>o</jats:italic>‐nitrobiphenylpropyl derivatives with enhanced photochemical properties for single photon excitation and high two‐photon absorption cross‐sections. Improved pattern resolution in 2D and the capability of 3D resolution using a scanning laser at 780 nm is demonstrated. This work demonstrates the potential of PUs as readily available, versatile, and easy‐to‐use photoresist materials for low‐cost lithography applications. <jats:boxed-text content-type="graphic" position="anchor"><jats:graphic xmlns:xlink="http://www.w3.org/1999/xlink" mimetype="image/jpg" position="anchor" specific-use="enlarged-web-image" xlink:href="graphic/marc201400331-abs-0001-m.jpg"><jats:alt-text>image</jats:alt-text></jats:graphic></jats:boxed-text></jats:p>
収録刊行物
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- Macromolecular Rapid Communications
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Macromolecular Rapid Communications 35 (20), 1801-1807, 2014-09-15
Wiley
