Fabrication of a new broadband waveguide polarizer with a double-layer 190 nm period metal-gratings using nanoimprint lithography

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  • Jian Wang
    NanoStructure Laboratory, Electrical Engineering Department, Princeton University, Princeton, New Jersey 08544
  • Steven Schablitsky
    NanoStructure Laboratory, Electrical Engineering Department, Princeton University, Princeton, New Jersey 08544
  • Zhaoning Yu
    NanoStructure Laboratory, Electrical Engineering Department, Princeton University, Princeton, New Jersey 08544
  • Wei Wu
    NanoStructure Laboratory, Electrical Engineering Department, Princeton University, Princeton, New Jersey 08544
  • Stephen Y. Chou
    NanoStructure Laboratory, Electrical Engineering Department, Princeton University, Princeton, New Jersey 08544

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<jats:p>We fabricated a new waveguide polarizer, that has a double-layer 190 nm period metal grating at the interface between the waveguide core and waveguide cladding layer. Both silicon nitride and polymethylmethancrylate were used as waveguide cores. 190 nm period gratings were patterned by nanoimprint lithography. The new type waveguide polarizer works as a broadband and highly efficient transverse magnetic-pass polarizer with transverse electric-polarized light highly attenuated. The new polarizer structure can be applied to almost any waveguide structures. The simple fabrication process, which is compatible with conventional device processing, makes it very attractive for integrated optoelectronic system.</jats:p>

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