Optical switching of Mg-rich Mg–Ni alloy thin films

  • K. Yoshimura
    Institute for Structural and Engineering Materials, National Institute of Advanced Industrial Science and Technology (AIST), 2266-98 Shimoshidami, Moriyama-ku, Nagoya 463-8560, Japan
  • Y. Yamada
    Institute for Structural and Engineering Materials, National Institute of Advanced Industrial Science and Technology (AIST), 2266-98 Shimoshidami, Moriyama-ku, Nagoya 463-8560, Japan
  • M. Okada
    Institute for Structural and Engineering Materials, National Institute of Advanced Industrial Science and Technology (AIST), 2266-98 Shimoshidami, Moriyama-ku, Nagoya 463-8560, Japan

書誌事項

公開日
2002-12-16
DOI
  • 10.1063/1.1530378
公開者
AIP Publishing

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説明

<jats:p>Mg–Ni alloy thin films were prepared by dc magnetron sputtering using Mg and Ni targets, and their optical switching property for hydrogen exposure has been investigated. Pd-capped MgNix (0.1&lt;x&lt;0.3) films show a good switchable mirror property. Optical transmittance of these Mg-rich Mg–Ni thin films in the hydride state is much improved compared with that of Mg2Ni thin film. We speculate that the variation of the ratio of Mg2NiH4 to MgH2 formed in the hydride state may cause this difference. Such a wide modulation range of optical switching is important for the application of this material to energy efficient smart windows.</jats:p>

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