Temporally resolved Schwarzschild microscope for the characterization of extreme ultraviolet emission in laser-produced plasmas

DOI PDF 被引用文献5件
  • Y. Tao
    Institute of Laser Engineering, Osaka University, 2-6 Yamada-oka, Suita, Osaka 565-0871, Japan
  • M. Nakai
    Institute of Laser Engineering, Osaka University, 2-6 Yamada-oka, Suita, Osaka 565-0871, Japan
  • H. Nishimura
    Institute of Laser Engineering, Osaka University, 2-6 Yamada-oka, Suita, Osaka 565-0871, Japan
  • S. Fujioka
    Institute of Laser Engineering, Osaka University, 2-6 Yamada-oka, Suita, Osaka 565-0871, Japan
  • T. Okuno
    Institute of Laser Engineering, Osaka University, 2-6 Yamada-oka, Suita, Osaka 565-0871, Japan
  • T. Fujiwara
    Institute of Laser Engineering, Osaka University, 2-6 Yamada-oka, Suita, Osaka 565-0871, Japan
  • N. Ueda
    Institute of Laser Engineering, Osaka University, 2-6 Yamada-oka, Suita, Osaka 565-0871, Japan
  • N. Miyanaga
    Institute of Laser Engineering, Osaka University, 2-6 Yamada-oka, Suita, Osaka 565-0871, Japan
  • Y. Izawa
    Institute of Laser Engineering, Osaka University, 2-6 Yamada-oka, Suita, Osaka 565-0871, Japan

説明

<jats:p>A temporally resolved monochromatic extreme ultraviolet (EUV) imager has been developed for use in EUV radiation source research. The imager consists of a Schwarzschild microscope, with near-normal-incident Mo/Si multilayer mirrors adjusted for 13.5 nm and 4% bandwidth, and an x-ray streak camera (XSC). The spatial resolution of the microscope was limited by the image detector’s resolution to 3.5 μm for the CCD camera and 15 μm for the XSC, respectively, for a field of view of 1.2 mm. With the high photon collection efficiency, clear streak images could be obtained on a single-shot basis with laser pulse energy as low as 50 mJ at an intensity of 1×1010 W/cm2. Expansion behavior of the EUV emission region was successfully observed for laser-produced Sn plasmas.</jats:p>

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