Electron-energy-loss characterization of the H-terminated Si(111) and Si(100) surfaces obtained by etching in NH4F
書誌事項
- 公開日
- 1991-07
- 権利情報
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- https://www.elsevier.com/tdm/userlicense/1.0/
- https://www.elsevier.com/legal/tdmrep-license
- DOI
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- 10.1016/0009-2614(91)80309-l
- 公開者
- Elsevier BV
この論文をさがす
収録刊行物
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- Chemical Physics Letters
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Chemical Physics Letters 181 (6), 537-543, 1991-07
Elsevier BV