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- Michael J Fasolka
- Optical Technology Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899;
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- Anne M Mayes
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139;
書誌事項
- 公開日
- 2001-08
- DOI
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- 10.1146/annurev.matsci.31.1.323
- 公開者
- Annual Reviews
この論文をさがす
説明
<jats:p>▪ Abstract A two-part review of research concerning block copolymer thin films is presented. The first section summarizes experimental and theoretical studies of the fundamental physics of these systems, concentrating upon the forces that govern film morphology. The role of film thickness and surface energetics on the morphology of compositionally symmetric, amorphous diblock copolymer films is emphasized, including considerations of boundary condition symmetry, so-called hybrid structures, and surface chemical expression. Discussions of compositionally asymmetric systems and emerging research areas, e.g., liquid-crystalline and A-B-C triblock systems, are also included. In the second section, technological applications of block copolymer films, e.g., as lithographic masks and photonic materials, are considered. Particular attention is paid to means by which microphase domain order and orientation can be controlled, including exploitation of thickness and surface effects, the application of external fields, and the use of patterned substrates.</jats:p>
収録刊行物
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- Annual Review of Materials Research
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Annual Review of Materials Research 31 (1), 323-355, 2001-08
Annual Reviews