Radial Variation of Measured Carrier Lifetimes in Epitaxial Layers Grown with Wafer Rotation

書誌事項

公開日
2012-05-14
権利情報
  • https://www.scientific.net/PolicyAndEthics/PublishingPolicies
  • https://www.scientific.net/license/TDM_Licenser.pdf
DOI
  • 10.4028/www.scientific.net/msf.717-720.289
公開者
Trans Tech Publications, Ltd.

説明

<jats:p>In this report we present homoepitaxial growth of 4H-SiC on the Si-face of nominally on-axis substrates with diameter up to 100 mm in a hot-wall chemical vapor deposition reactor. A comparatively low carrier lifetime has been observed in these layers. Also, local variations in carrier lifetime are different from standard off-cut epilayers. The properties of layers were studied with more focus on charge carrier lifetime and its correlation with starting growth conditions, in-homogeneous surface morphology and different growth mechanisms.</jats:p>

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