Pressure-Dependent Growth of Wafer-Scale Few-layer h-BN by Metal–Organic Chemical Vapor Deposition
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- Dong Yeong Kim
- Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea
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- Nam Han
- Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea
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- Hokyeong Jeong
- Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea
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- Jaewon Kim
- Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea
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- Sunyong Hwang
- Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea
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- Kyung Song
- Materials Modeling and Characterization Department, Korea Institute of Materials Science (KIMS), Changwon 51508, Republic of Korea
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- Si-Young Choi
- Materials Modeling and Characterization Department, Korea Institute of Materials Science (KIMS), Changwon 51508, Republic of Korea
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- Jong Kyu Kim
- Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea
収録刊行物
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- Crystal Growth & Design
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Crystal Growth & Design 17 (5), 2569-2575, 2017-03-30
American Chemical Society (ACS)