Mold-assisted nanolithography: A process for reliable pattern replication

DOI PDF 被引用文献194件
  • Jan Haisma
    Philips Research Laboratories, Prof. Holstlaan 4, 5656 AA Eindhoven, The Netherlands
  • Martin Verheijen
    Philips Research Laboratories, Prof. Holstlaan 4, 5656 AA Eindhoven, The Netherlands
  • Kees van den Heuvel
    Philips Research Laboratories, Prof. Holstlaan 4, 5656 AA Eindhoven, The Netherlands
  • Jan van den Berg
    Philips Research Laboratories, Prof. Holstlaan 4, 5656 AA Eindhoven, The Netherlands

書誌事項

公開日
1996-11-01
DOI
  • 10.1116/1.588604
公開者
American Vacuum Society

この論文をさがす

説明

<jats:p>A process for reproducibly and reliably realizing thin-layer patterning having details with dimensions of 100 nm or even less is described. This process has been called mold lithography. It is a two-step process: First, a photopolymerization-replication step is carried out, after which pattern transfer is realized through, e.g., wet or dry etching into the substrate material. We performed a number of elementary experiments to evaluate this process. Processing conditions are given and the obtained results are discussed. The strengths of this process are its simplicity and low cost while maintaining compatibility with (standard) semiconductor-technology processing.</jats:p>

収録刊行物

被引用文献 (194)*注記

もっと見る

詳細情報 詳細情報について

問題の指摘

ページトップへ