Low‐Temperature Deposition of Highly Textured Aluminum Nitride by Direct Current Magnetron Sputtering for Applications in Thin‐Film Resonators
-
- R. S. Naik
- Microsystems Technology Laboratories, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States of America
-
- R. Reif
- Microsystems Technology Laboratories, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States of America
-
- J. J. Lutsky
- Microsystems Technology Laboratories, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States of America
-
- C. G. Sodini
- Microsystems Technology Laboratories, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States of America
書誌事項
- 公開日
- 1999-02-01
- 権利情報
-
- https://iopscience.iop.org/page/copyright
- https://iopscience.iop.org/info/page/text-and-data-mining
- DOI
-
- 10.1149/1.1391664
- 公開者
- The Electrochemical Society
この論文をさがす
収録刊行物
-
- Journal of The Electrochemical Society
-
Journal of The Electrochemical Society 146 (2), 691-696, 1999-02-01
The Electrochemical Society