Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiO<sub>x</sub> by Chemical Vapor Deposition
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- Jinbo Pang
- IFW-Dresden, Helmholtz Strasse 20, D-01171 Dresden, Germany
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- Rafael G. Mendes
- IFW-Dresden, Helmholtz Strasse 20, D-01171 Dresden, Germany
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- Pawel S. Wrobel
- Centre of Polymer and Carbon Materials, Polish Academy of Sciences, ul. M. Curie-Sklodowskiej 34, Zabrze, PL-41-819 Zabrze, Poland
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- Michal D. Wlodarski
- Centre of Polymer and Carbon Materials, Polish Academy of Sciences, ul. M. Curie-Sklodowskiej 34, Zabrze, PL-41-819 Zabrze, Poland
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- Huy Quang Ta
- IFW-Dresden, Helmholtz Strasse 20, D-01171 Dresden, Germany
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- Lars Giebeler
- IFW-Dresden, Helmholtz Strasse 20, D-01171 Dresden, Germany
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- Barbara Trzebicka
- Centre of Polymer and Carbon Materials, Polish Academy of Sciences, ul. M. Curie-Sklodowskiej 34, Zabrze, PL-41-819 Zabrze, Poland
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- Thomas Gemming
- IFW-Dresden, Helmholtz Strasse 20, D-01171 Dresden, Germany
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- Lei Fu
- College of Chemistry and Molecular Science, Wuhan University, Wuhan, 430072, China
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- Zhongfan Liu
- Center for Nanochemistry (CNC), Beijing Science and Engineering Center for Nanocarbons, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, China
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- Juergen Eckert
- Erich Schmid Institute of Materials Science, Austrian Academy of Sciences, Jahnstraße 12, A-8700 Leoben, Austria
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- Alicja Bachmatiuk
- IFW-Dresden, Helmholtz Strasse 20, D-01171 Dresden, Germany
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- Mark H. Rümmeli
- IFW-Dresden, Helmholtz Strasse 20, D-01171 Dresden, Germany
書誌事項
- 公開日
- 2017-01-26
- DOI
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- 10.1021/acsnano.6b08069
- 公開者
- American Chemical Society (ACS)
この論文をさがす
収録刊行物
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- ACS Nano
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ACS Nano 11 (2), 1946-1956, 2017-01-26
American Chemical Society (ACS)
