Production of H− ions with addition of cesium or xenon to a hydrogen discharge in a small multicusp ion source
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- S. R. Walther
- Lawrence Berkeley Laboratory, University of California, Berkeley, California 94720
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- K. N. Leung
- Lawrence Berkeley Laboratory, University of California, Berkeley, California 94720
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- W. B. Kunkel
- Lawrence Berkeley Laboratory, University of California, Berkeley, California 94720
抄録
<jats:p>The effect on H− ion production by adding cesium or xenon to a hydrogen discharge, in a small magnetically filtered multicusp ion source, has been investigated. Addition of cesium vapor to the hydrogen discharge resulted in a factor of 16 increase in H− output relative to the uncesiated discharge for the same operating parameters. Likewise, the addition of xenon gas to a hydrogen discharge resulted in a factor of 2.7 increase in H− output over pure hydrogen operation at optimum H2 source pressure, while maintaining the same arc parameters. Operation of the source with the plasma electrode at optimum bias voltage was essential to obtain this result.</jats:p>
収録刊行物
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- Journal of Applied Physics
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Journal of Applied Physics 64 (7), 3424-3428, 1988-10-01
AIP Publishing
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詳細情報 詳細情報について
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- CRID
- 1362825895269041280
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- DOI
- 10.1063/1.341498
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- ISSN
- 10897550
- 00218979
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- データソース種別
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- Crossref