The Nucleation of CVD Silicon on SiO2 and Si3 N 4 Substrates: I . The System at High Temperatures
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- W. A. P. Claassen
- Philips Research Laboratories, Eindhoven, The Netherlands
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- J. Bloem
- Philips Research Laboratories, Eindhoven, The Netherlands
書誌事項
- 公開日
- 1980-01-01
- 権利情報
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- https://iopscience.iop.org/page/copyright
- https://iopscience.iop.org/info/page/text-and-data-mining
- DOI
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- 10.1149/1.2129616
- 公開者
- The Electrochemical Society
この論文をさがす
収録刊行物
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- Journal of The Electrochemical Society
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Journal of The Electrochemical Society 127 (1), 194-202, 1980-01-01
The Electrochemical Society